Products
Contact Us

Mosten Alloy Co., Ltd.
Add: No.88 Jizhong Road, Shanghai,China    201609
Tel: +86 21 56656028
Fax: +86 21 56656030
Email: info@mostenalloy.com
Products
Tungsten >>

Tungsten Target

  • Tungsten target
  • Tungsten sputtering target
  • W target
The purity of tungsten target we produce highest is 99.97%. Density ranges from 18.8 to 19 g/cm3. It has homogenous structure and grain size. Due to its high melting points, plasticity, low expansion coefficient, resistivity and good thermal stability, pure tungsten and tungsten alloy targets are widely used for semi-conductor integrated circuit, surface monitor, solar energy photovoltaic and X-ray. Tungsten target can be used with old sputtering equipment, also with the newest technical device such as solar energy battery, fuel battery and large scaled coating for chips.

Tungsten target is produced by sintering tungsten powder. Tungsten target is solid and its surface is bright. We can produce tungsten target as customers’ requirements. Metal tungsten has good ductility. So it can be used for cathode target in X-ray tube. This tungsten target owns homogeneous, good thermal conductivity, high melting point, low vapor pressure. So it can be applied to glass, LCD screen, LED and electrical industry.

Tungsten Target

The density of tungsten target ranges from 18.8 to 19 g/cm3, having homogeneous tissue structure and grain size. Because of its high melting point, plasticity, low expansion coefficient, resistivity and good thermal stability, pure tungsten and tungsten alloy target are widely used for semi-conductor integrated circuit, surface monitor, solar energy photovoltaic and X-ray. Tungsten target can be used with old sputtering equipment, also with the newest technical device such as solar energy battery, fuel battery and large scaled coating for chips.

Tungsten sputtering target

Tungsten sputtering target has adopted the best technique including X-ray fluorescence (XRF), Glow discharge mass spectrometry (GDMS), inductively coupled plasma (ICP). A new way to make material of thin film is sputtering physical vapor deposition (PCD). The thin film made by sputtering material is high density and good adhesion. High purity of metals and alloy target are necessary for the widely used magnetron sputtering technology. We produce tungsten sputtering target as customers’ requirements.