Molybdenum alloy target material
Molybdenum is a gray transition metal and is a refractory metal. It is located in subgroup VI A in the periodic table and has an ordinal number of 42 and an atomic weight of 95.94. Molybdenum and its alloys have excellent conductivity and thermal stability. Molybdenum alloy as electrode, wiring material or barrier material in TFT manufacturing has great application prospect. The advantage of sputtering target with molybdenum alloy is to improve the specific brightness, contrast, color and life of the device. More importantly, the use of molybdenum sputtering targets is more environmentally friendly than the use of chromium sputtering targets. Therefore, molybdenum and its alloys have now replaced chromium in the manufacture of flat display devices such as liquid crystal displays.
The magnetron sputtering molybdenum alloy target is generally divided into two kinds of planar (which is also divided into rectangular strip type and disk type) target and circular tube rotating target. Due to the combined effect of its electric field and magnetic field, the sputtering rate of the planar target in the entire sputtering plane is very uneven, and the so-called "runway area" etched deep groove will be formed. Once the "runway area" etched deep groove runs through the target, the target is abandoned, so the material utilization rate of the planar target is generally about 25% to 30%. In order to avoid this shortcoming, the cylindrical tube rotating target can be used, because of the basic consistency of the sputtering rate of the material along the axial direction of the target, its material utilization rate can generally reach about 70%.
